Morning Meeting : Resist TWG meeting EUV Resist / Alternative Materials (8.30 hrs - 12.00 hrs)
Location: MECC, Room 0.4
Chair: Fan, Yu-Jen
Meeting agenda:
Meeting cost: Free of charge and is only open to the EUVL Symposium participants, registration through the online registration form however is mandatory.
12.00 hrs: Lunch
Afternoon Meeting: EUV mask/pellicle TWG meeting (13.00 hrs - 16.30 hrs)
Location: MECC, Room 0.4
Chair: Emily Gallagher
Meeting agenda:
|
Affiliation |
Speaker |
Introduction: goals, structure of agenda, etc. |
imec |
Emily Gallagher |
1. Pellicle requirements from
industry: |
|
|
NXE pellicle progress update |
ASML |
Dan Smith |
TSMC perspective on the EUV
pellicle |
TSMC |
Jack Chen |
Issues with the Si based EUV pellicle |
Samsung |
Sungwon Kwon |
EUV Pellicle manufacturability |
Intel |
Ted Liang |
Globalfoundries' perspective on
the EUV pellicle |
GF |
Eric Hosler |
2. Membrane development |
|
|
Pellicle Membrane Development at
Luxel Corporation |
Luxel |
Travis Ayers |
Graphene pellicles |
ANL |
Richard van Rijn |
Pellicle membrane development at
Norcada/Exogenesis |
Norcada/ Exogenesis |
Sean Kirkpatrick |
Pellicle membrane development at
imec |
imec |
Johannes Vanpaemel |
discussion/buffer/break |
||
3. Membrane metrology |
|
|
EUV optical characterization and
lifetime testing facilities of PTB |
PTB |
Christian Laubis |
Challenges of the in-lab pellicle
transmission metrology |
RTWH |
Serhiy Danyluk |
Recent pellicle transmission measurement
results |
EUVTech |
Chami Perera |
4. Supply chain update: |
|
|
FST's status & inspection
system for EUV Pellicle |
FST |
Donwon Park |
Cleaning tool supplier perspective |
Suss |
Jens Kruemberg |
Entegris progress/status of pellicle
capable EUV pods |
Entegris |
Chris Newman |
Wrap-up & Discussion |