EUVL Symposium
 
Sunday, October 4


Morning Meeting : Resist TWG meeting EUV Resist / Alternative Materials (8.30 hrs - 12.00 hrs)
Location: MECC, Room 0.4

Chair: Fan, Yu-Jen

Meeting agenda:

Opening & Welcome (Stefan Wurm, Globalfoundries/SUNY Poly SEMATECH)

Resist performance review and requirements discussion (Yu-Jen Fan, SUNY Poly SEMATECH)

Session 1: EUV/Alternative Resist
Soft X-ray Absorption Spectroscopy using SR for EUV Resist Chemical Reaction Analysis (Takeo Watanabe, University of Hyogo)
Measurements of PAG reaction cross sections to low energy electrons (Gregory Denbeaux, SUNY Poly Institute)
Progress of DDRM for EUV lithography (Rikimaru Sakamoto, Nissan Chemical)
Resist development update at Inpria (Andrew Grenville, Inpria)
Alternative material status at imec (Danilo De Simone, imec)
LBNL updates, (Patrick Naulleau, LBNL)

Coffee break

Session 2: Outgas Testing
Outgassing of CAR and alternative resists: The way forward (Gijsbert Rispens, ASML)
Update of resist outgas testing at EIDEC (Eishi Shiobara, EIDEC)
A plan to measure EUV resist contamination in the presence of hydrogen (Gregory Denbeaux for NIST)

Summary (Yu-Jen Fan, SUNY Poly SEMATECH)

Meeting cost: Free of charge and is only open to the EUVL Symposium participants, registration through the online registration form however is mandatory.

 

12.00 hrs: Lunch


 

Afternoon Meeting: EUV mask/pellicle TWG meeting (13.00 hrs - 16.30 hrs)
Location: MECC, Room 0.4

Chair: Emily Gallagher

Meeting agenda: 


 

Affiliation

Speaker

Introduction: goals, structure of agenda, etc.

imec

Emily Gallagher

1. Pellicle requirements from industry:

 

 

NXE pellicle progress update

ASML

Dan Smith

TSMC perspective on the EUV pellicle

TSMC

Jack Chen

Issues with the Si based EUV pellicle

Samsung

Sungwon Kwon

EUV Pellicle manufacturability

Intel

Ted Liang

Globalfoundries' perspective on the EUV pellicle

GF

Eric Hosler

2. Membrane development

 

 

Pellicle Membrane Development at Luxel Corporation

Luxel

Travis Ayers

Graphene pellicles

ANL

Richard van Rijn

Pellicle membrane development at Norcada/Exogenesis

Norcada/

Exogenesis

Sean Kirkpatrick

Pellicle membrane development at imec

imec

Johannes Vanpaemel

discussion/buffer/break

3. Membrane metrology

 

 

EUV optical characterization and lifetime testing facilities of PTB

PTB

Christian Laubis

Challenges of the in-lab pellicle transmission metrology

RTWH

Serhiy Danyluk

Recent pellicle transmission measurement results

EUVTech

Chami Perera

4. Supply chain update:

 

 

FST's status & inspection system for EUV Pellicle

FST

Donwon Park

Cleaning tool supplier perspective

Suss

Jens Kruemberg

Entegris progress/status of pellicle capable EUV pods

Entegris

Chris Newman

Wrap-up & Discussion


Meeting cost: Free of charge and is only open to the EUVL Symposium participants, registration through the online registration form however is mandatory.