OSA 2015 International Workshop on Compact EUV & X-ray Light Sources
Date
8-9 October 2015
Where
MECC, Maastricht
Organizing Committee
Lahsen Assoufid, Argonne National Laboratory
Patrick Naulleau, Lawrence Berkeley National Laboratory
Program Overview
Emerging compact extreme-ultraviolet and x-ray sources small enough to be installed in laboratories, manufacturing facilities, and hospitals will revolutionize scientific disciplines complementing large scale synchrotron radiation sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, defense and security, and industrial non-destructive testing.
To aid in the development of such sources, OSA recently launched a series of international meetings on the topic with the goal of facilitating communications between source developers and end users, disseminating information on currently available source, and understanding application-based performance targets for future sources. The upcoming two-day workshop will be the third in the series and will again gather compact light source developers, potential users, and others interested in this new field to present their work, exchange ideas, and to network with colleagues with diverse needs and interests.
As was done last October, this year’s workshop will be collocated with the International Symposium on Extreme Ultraviolet Lithography to be held in Maastricht, Netherlands. This will continue to build upon the work began at the 2013 Incubator again providing a unique opportunity for the EUV and X-ray light source developers to interact with potential semiconductor industry users, learn about their fundamental and practical needs, and assess the current status of EUV/Soft X-ray sources. The two programs will coordinate to encourage interaction / discussion between the compact x-ray source developers and the end users. As with past meetings, however, the OSA workshop will remain much broader in scope than EUV lithography further encompassing hard and soft x-ray applications in semiconductor wafer inspection, biomedical, materials, energy, etc.
Contributions to the workshop are sought in source concepts, technologies and subsystems as well in current and future potential applications. The workshop will include a few of plenary talks geared towards motivating open discussions and focused breakout sessions.
Preliminary Meeting Schedule
Day 1: Thursday, 8 October 2015
● Breakfast, location to be determined, begins at 8:00
● Program begins at 8:30, lunch is included onsite
● Reception, location to be determined, begins at 18:00
Day 2: Friday, 9 October 2015
● Breakfast, location to be determined, begins at 8:00
● Program begins at 8:30, lunch is included onsite
● Program adjourns at 13:00
Interested in attending?
Register for the combined meeting EUVL-OSA Workshop through the registration form on this website.
If you only want to attend the OSA Workshop, please contact OSA.
